发明名称 METHOD AND DEVICE FOR PHOTO-MASK INSPECTION
摘要 PURPOSE:To confirm a changed part when one part of design data is changed by providing a referring data developing part in a data comparison type inspection device. CONSTITUTION:For the constitution of the design data comparison type inspection device, a referring data developing part 10 to decompose only a changed pattern, out of the design data, to a picture element and to digitize the pattern and a display part 9 to display referring data as well are added. Thus, when the design data are changed, checking is executed by using data for check before the change. Then, when the changed part is detected as a defect, the changed part can be conformed by displaying the referring data on the display part 9.
申请公布号 JPH02110565(A) 申请公布日期 1990.04.23
申请号 JP19880262951 申请日期 1988.10.20
申请人 MATSUSHITA ELECTRON CORP 发明人 NIIKE TAKUMI
分类号 G01N21/88;G01N21/956;G03F1/84;H01L21/027;H01L21/30;H01L21/66 主分类号 G01N21/88
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