发明名称 FORMATION OF METAL PATTERN
摘要 PURPOSE:To form a three-dimensional metal pattern having increased electrical conductivity by successively forming an electrically conductive thin film, a plating layer and a patterned resist on the surface of a synthetic resin film and removing the parts of the plating layer and the electrically conductive thin film not covered with the resist. CONSTITUTION:The surface of a resin film 1 of polyimide, etc., is sandblasted with abrasive grains of about 180-300 mesh to increase the surface area. An electrically conductive thin film 2 of ITO, Cu, Ni, etc., is formed on the surface of the film 1 by dry plating such as ionic bombardment and a plating layer 3 of Cu, Ni, etc., is formed on the thin film 2. A resist 4 having a desired pattern is formed on the plating layer 3 with resist ink and the parts of the layer 3 and the thin film 2 not covered with the resist 4 are removed by sandblast or with an acid or alkali. A metal pattern suitable for a name plate, a printed circuit board, etc., is formed.
申请公布号 JPH02107787(A) 申请公布日期 1990.04.19
申请号 JP19880259980 申请日期 1988.10.15
申请人 HITAKE SEIKO KK 发明人 TAKENOIRI YASUO;YAMASHITA KAZUHIRO;OKUHARA TAKAO;IZUMI YASUO;AOKI TSUKASA
分类号 C23F1/02;H05K3/06;H05K3/20 主分类号 C23F1/02
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