| 摘要 |
PURPOSE:To improve the sensitivity of the subject material without generating a fog and changing the gamma value of the photosensitive material at the time of extending the processing time of the material from a standard developing time by incorporating a silver halide particle which is chemically sensitized and has a specified mean silver iodide content, in a silver halide emulsion layer mounted on a substrate body. CONSTITUTION:The silver halide particle which is chemically sensitized and has >=4mol.% of the mean silver iodide content is incorporated in a layer close to the surface of the emulsion layer, and also the surface of the emulsion layer. The layer close to the surface of the silver halide particle means the layer positioned at a distance of <=300Angstrom , preferably 130-30Angstrom in the direction of a depth from the surface of a particle to the center of the particle. The composition of the silver halide is composed of silver iodobromide, silver iodochloride or silver iodochlorobromide, and is preferably composed of silver iodobromide in the point that the silver halide emulsion with high sensitivity is obtd. Thus, the photosensitive material with the high sensitivity is obtd. |
