| 摘要 |
A photolithographic composition comprised of poly(vinylpyridine), a non-photosensitive light attenuating material and a solvent having a molecular weight from about 70 to 120 and a flashpoint from about 28 degrees C to about 45 degrees C, the method of making that composition, its use in a photographable article and its use in a method for dry-etching a photolithographic image into a micro-electronic substrate without the need for an oxygen-etch barrier layer. |
