PECVD (plasma enhanced chemical vapor deposition) method for depositing of tungsten or layers containing tungsten by in situ formation of tungsten fluorides
摘要
申请公布号
US4918033(A)
申请公布日期
1990.04.17
申请号
US19880239569
申请日期
1988.09.01
申请人
INTERNATIONAL BUSINESS MACHINES CORPORATION
发明人
BARTHA, JOHANN W.;BAYER, THOMAS;GRESCHNER, JOHANN;KRAUS, GEORG;SCHMID, GERHARD
