Process for producing photosensitive negative working diazo resin lithographic plate using admixture of at least three solvents

摘要

A process for producing a photosensitive lithographic plate comprises coating onto a substrate having a hydrophilic surface a solution of a negative working photosensitive composition containing a photosensitive diazo resin and a linear organic polymer dissolved in a solvent mixture comprising: (a) at least 10 wt. % of 1-methoxy-2-propanol, (b) an amino group-free polar solvent having a boiling point under 1 atm of 50 DEG to 100 DEG C. and a dielectric constant at 20 DEG C. of at least 5.5, and (c) 2 to 50 wt. % of methyl lactate, and drying the coated solution.