| 摘要 |
PURPOSE:To prevent exposure by electrons reflected from a jig and also to prevent charge-up of reflected electrons by covering beforehand the mounting face of the surface of a jig in the structure of supporting a sample at the rear with conductive substance whose atom number is below 13, when irradiating the sample placed on the supporting jig with electron beams or X-rays. CONSTITUTION:When irradiating a sample such as, for example, a mask for exposure, etc., being placed on a supporting jig with electron beams or X-rays, the structure of the jig is made as follows. That is, an opening is provided beforehand at the center of a top regulating jig 1 whose bottom is recessed, and a rear fixing jig 2 is set in the recess, and a sample is placed thereon to correspond to the opening of the jig 1. At this time, for example, a carbon plate 3 whose surface is plane and whose atom number is below 13 is set at the mounting face of the sample of the jig 2 and the periphery is fixed with a plurality of fixing screws 4, and the sample is put on the surface of the carbon plate 3 corresponding to the opening of the jig 1. Hereupon, as the carbon plate 3 has a function of decreasing reflected electrons and secondary electrons, exposure by secondary electrons arising in the jig 2 does not occur. |
