| 摘要 |
PURPOSE:To prevent adhesion of dust, etc., due to static electricity and to prevent the occurrence of a mask defect by treating material with the potential of a resist film kept the same as the ground after the surface of a hard mask blank is exposed. CONSTITUTION:After a hard mask blank 1 is irradiated an electron beam 41, the subsequent treatment is executed with the potential of the resist film 4 kept the same as the ground. To ground a chrome film 3, an electrode 11 is brought into contact with a part exposed to the side of the hard mask blank of the film 3 being a conductor, and a conductive wire 12 is grounded to the part. Through the use of a hard mask blank placing table 21, the hard mask blank 1 is placed on the bottom 22a of a base 22, and the film 3 is pressed and held with pins 23a and 14b through the springs 24a and 24b of the table 21. Then the films 3 and 4 are grounded through the conductive wire 25 similarly. In such a way, the surface of the film 4 is not electrified; therefore the adhesion of dust, etc., is eliminated to prevent the occurrence of a mask defect. In addition, operability is improved. |
