| 摘要 |
PURPOSE:To manage proceeding of etching by arranging a plurality of resist pattern for estimating the tooth width on a portion of a face identical to the pole tooth forming face of a core. CONSTITUTION:The surface of a secondary core 1 is masked with a resist film then treated optically and chemically, thereafter a resist pattern 2 for forming pole teeth and resist patterns 3 for estimating the tooth width which varies in step are formed on an identical face. As etching proceeds, the both side faces of the resist patterns 3-a to 3-g in the lower section of the resist pattern 3 are corroded. Some of the resist pattern 3-a to 3-g satisfying the relation 11, 12, 13...<2d, where d is the side etching width, are removed and the pole tooth width 6-a can be estimated based on the number of removed patterns. |
