发明名称 EXPOSURE DEVICE
摘要 PURPOSE:To enhance a uniformity of an exposure line width and to enhance an overall overlapping accuracy by a method wherein a means which corrects a posture of an ligner with reference to an external standard in real time is installed at a vibration-removing mechanism of the exposure device. CONSTITUTION:During an exposure sequence, a distance between a displacement meter 13 and a target 14 is always measured; when the distance deviates from a preset range, it is fed back to a vibration-removing unit 7 and is servo-locked within the preset range. A feedback system sets a solenois valve 30 to a closed state and a solenoid valve 29 to an open state by using a controlling circuit 35, e.g., when a gap between the target 14 and the displacement meter 13 is widened; it instructs a drive circuit 36 about an opening area of an electropneumatic proportional valve 31; it actuates three vibration-removing units independently; it acts so as to set the distance between the displacement meter 13 and the target 14 at the preset range. A surge tank 32 prevents a hunting phenomenon of the vibration-removing units; speed controllers 33, 34 are used to set a servo gain of a delivery and evacuation system. Thereby, an overall overlapping accuracy and a uniformity of an exposure line width can be enhanced.
申请公布号 JPH0298918(A) 申请公布日期 1990.04.11
申请号 JP19880252761 申请日期 1988.10.05
申请人 CANON INC 发明人 IWAMOTO KAZUNORI;UZAWA SHUNICHI;KARIYA TAKUO;EBINUMA RYUICHI
分类号 G03F9/00;G03F7/20;H01L21/027;H01L21/30 主分类号 G03F9/00
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