| 摘要 |
PURPOSE:To obtain resist patterns with good shapes and high accuracy by treating a resist by an alkaline soln. after application of the resist, then heating the resist. CONSTITUTION:After the resist 2 is applied on a substrate 1, the resist is treated by the alkaline soln. 3 and is further subjected to processes of heating, exposing, heating, and developing to form the resist patterns 2A. The alkaline soln. 3 can be diffused to the resist 2 surface by the first heating. The alkaline soln. 3 can be further diffused into the inside of the resist 2 by the heating after the exposing. The chipping of the patterns by the diffracted light in the unexposed parts, more particularly, the edge parts of the patterns is obviated in this way and the patterns 2A having the high aspect ratio are obtd. |
