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发明名称
IMMERSION TREATMENT TANK FOR SEMICONDUCTOR SUBSTRATE
摘要
申请公布号
JPH0298931(A)
申请公布日期
1990.04.11
申请号
JP19880252608
申请日期
1988.10.05
申请人
NEC CORP
发明人
SEO YUJI
分类号
H01L21/306;H01L21/304
主分类号
H01L21/306
代理机构
代理人
主权项
地址
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