| 摘要 |
PURPOSE:To prevent unexpected exposure from occurring by eliminating the irregular reflection of a beam of light at the time of performing photoengraving in the manufacturing process of an LSI by deciding the interval of lattice points by assuming that mask patterns corresponding to wiring symbols being superposed mutually are shifted by a prescribed distance, respectively. CONSTITUTION:It is discriminated whether or not plural wiring symbols arranged advancing in the same direction on one lattic point exist. When the plural wiring symbols exist i.e. the plural wiring symbols are superposed mutually, the interval of the lattice points is decided by assuming that each of the mask patterns corresponding to the wiring symbol is shifted in the prescribed direction by the prescribed distance. Thereby, it is possible to prevent the exposure due to the irregular reflection of the beam of light at the time of performing the photoengraving in the manufacturing process of the LSI. |
