Selective polishing method.

摘要

A selective polishing method comprises polishing the surface of a body to be polished having a region comprising Si3N4 and a region comprising a material more easily workable than said Si3N4 provided with a difference in height with the surface of the region comprising said more easily workable material being made higher with an abrasive comprising colloidal silica or an abrasive comprising colloidal silica as the solute and water as the solvent.