发明名称 |
Radiation-sensitive compositions and their use. |
摘要 |
The invention relates to radiation-sensitive mixtures of certain precursors and carbonyl compounds which contain aromatic radicals and, in the UV-excited state, are capable of hydrogen abstraction, which mixtures experience a solubility differentiation on irradiation with actinic light and are suitable for the preparation of polyimides, polyisoindoloquinazolinediones, polyoxazinediones, polyquinazolinediones or polyquinazolones. They are suitable for the production of insulating layers and printed circuit boards.
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申请公布号 |
EP0362644(A1) |
申请公布日期 |
1990.04.11 |
申请号 |
EP19890117607 |
申请日期 |
1989.09.23 |
申请人 |
BASF AKTIENGESELLSCHAFT |
发明人 |
BLUM, RAINER;REHMER, GERD, DR.;SCHUPP, HANS, DR. |
分类号 |
C08J3/28;C08G73/06;C08G73/10;C08L79/04;C08L79/08;C09D179/00;C09D179/04;C09D179/08;G02B6/44;G03F7/038 |
主分类号 |
C08J3/28 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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