| 摘要 |
PURPOSE:To improve the positional accuracy of a pattern by a method wherein a support part for mechanical distortion prevention use is provided, is bridged between the mutually opposed parts on the side of the rear of a substrate through a through hole and the distortion of a mask for X-ray exposure use is reduced by using the support part. CONSTITUTION:A rear film 12 is formed on the mutually opposed parts on the side of the rear of a mask substrate 6 through a through hole 4 in the substrate 6. Moreover, a cruciform support part 18 for mechanical distortion prevention use of a mask 16 for X-ray exposure use is bridged using the film 12. Here, if there is relation which is shown by a formula: W<S(T+d)/(D+d), the part 18 does not have an effect on a pattern transfer. Thereby, the distortion of the mask 16, which is caused by the stress of an X-ray absorption film 10, is reduced by the part 18 and the positional accuracy of a mask pattern is improved. The S and the D in the formula respectively show the diameter of an X-radiation and the distance between an X-ray supply source and the upper surface of the film 10 of the mask 16. Moreover, the T shows the total value of the thicknesses of each substrate 6, a membrane 8 and the film 10, the (d) shows the distance between the upper surface of the film 10 and a wafer and the W shows the width of the part 18. |
