发明名称 MASK FOR X-RAY EXPOSURE USE
摘要 PURPOSE:To support a mask for X-ray exposure use without using a particular jig by a method wherein holding members for distortion prevention use are provided, formed of a material having a thermal expansion coefficient identical or almost identical with that of a supporting frame, and the generation of distortion of a membrane is prevented. CONSTITUTION:Annular holding members 32 are formed on outer peripheral end faces 14 of a supporting frame 4. A material having a thermal expansion coefficient identical or in a degree identical with that of the frame 4 is used for the members 32. Moreover, the members 32 are formed as a separate member separately from the frame 4, are formed their sections into a triangle-shaped annular structure and are provided for distortion prevention use. Thereby, it becomes possible to etch the rear of the frame 4 to hold the stress of a membrane 6 in its original state by the members 32, to prevent the generation of distortion of the membrane 6 and to contrive to be free from transfer pattern problems and to improve transfer accuracy. Moreover, as the members 32 are formed into a triangle-shaped protrusion, a mask 30 for X-ray exposure use can be supported without using a jig of a particular configuration.
申请公布号 JPH0298124(A) 申请公布日期 1990.04.10
申请号 JP19880251084 申请日期 1988.10.04
申请人 MITSUBISHI ELECTRIC CORP 发明人 MATSUDA SHUICHI
分类号 G03F1/22;H01L21/027 主分类号 G03F1/22
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