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发明名称
PRETREATMENT PROCESS FOR SEMICONDUCTOR WAFER LIFE TIME MEASUREMENT
摘要
申请公布号
JPH0298134(A)
申请公布日期
1990.04.10
申请号
JP19880250689
申请日期
1988.10.04
申请人
MITSUBISHI METAL CORP;JAPAN SILICON CO LTD
发明人
MORITA ETSURO;SAKURAI MARI;SHIMANUKI YASUSHI
分类号
H01L21/304;H01L21/66
主分类号
H01L21/304
代理机构
代理人
主权项
地址
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