| 摘要 |
PURPOSE:To improve the reliability concerning dimensional stability, precision improvement, etc., of a mask structure by keeping a specified relation of the flatness of the flat edge face of uppermost part with respect to values of an inner radius of a ring-type holding frame of the mask structure, an inner radius of an X-ray absorber pattern region and the flatness required in the absorber pattern region. CONSTITUTION:In an X-ray mask structure, the following are arranged; an X-ray absorber 1, a retaining film 2 to protect the absorber 1, and a holding frame 3 to retain the above members. The surface roughness of the uppermost part flat edge face 3a of the holding frame 3 is equal or less than 0.5mumRa. The retaining film 2 retains the structure with a tension in the range of 10<7>-10<9> dyne/cm<2>. When the inner radius of the ring-type holding frame 3 is lmm, and the inner radius of the X-ray absorber 1 pattern region is (r)mm, the flatness (t)mum of the uppermost part flat edge face 3a necessary for the flatness alphamum required for the absorbing pattern region must satisfy t<=l/rXalpha. Thereby, de sired flatness in the pattern region in the absorber is obtained, and reliability of dimensional stability, precision improvement, etc., can be increased. |
