| 发明名称 |
ORGANIC-INORGANIC FILM DEPOSITED ON A GLASS SUBSTRATE POSSIBLY COATED WITH ONE OR MORE THIN METALLIC LAYERS |
| 摘要 |
<p>1. Film of organosilicon compound deposited on a glass substrate, either directly or on an intermediate layer, and produced by polymerization under plasma in the presence of oxygen, characterized in that the discharge creating the plasma has a frequency lower than 1 megahertz and that the thickness of the film is at most 100 nm.</p> |
| 申请公布号 |
EP0230188(B1) |
申请公布日期 |
1990.04.04 |
| 申请号 |
EP19860402839 |
申请日期 |
1986.12.17 |
| 申请人 |
SAINT-GOBAIN VITRAGE INTERNATIONAL |
发明人 |
BROCHOT, JEAN-PIERRE;SOHIER, PHILIPPE;CECCAROLI, BRUNO |
| 分类号 |
C03C17/34;C03C17/30;C03C17/38;C03C17/42 |
主分类号 |
C03C17/34 |
| 代理机构 |
|
代理人 |
|
| 主权项 |
|
| 地址 |
|
