METHOD OF MAKING MINIMUM CONNECTION WINDOW OF SEMICONDUCTOR DEVICE

摘要

PURPOSE: To strengthen the resolving power by forming a connecting window using a rectangular mask pattern for minimum connecting window in lithographic step. CONSTITUTION: After bonding a photoresist 1 onto a substrate 2, a mask pattern forming a connecting window is formed in rectangular form of one side W3 wider than the marginal value W1 of the minimum resolving width while the other side W2 narrower than the marginal value W1. When the photoresist 1 in the connecting window position in such a state is developed, the proximity effect wherein the side W3 wider than the marginal W1 promotes the developement of the other side W2 narrower than the marginal value W1 is gained, thereby enabling the connecting window in the W2 narrower than the marginal value W1 of the minimum resolving width to be formed.