Developer composition.

摘要

A developer composition having improved resistance to vinyl blocking comprises a finely divided thermoplastic phenolic resin and a finely divided thermoplastic vinylic or acrylic resin. The vinylic or acrylic resin is prepared from a monomer composition containing a polar monomer which renders the composition resistant to vinyl plasticizers. Developer sheets prepared from the developer composition and processes for forming images utilizing the developer composition are also described.