发明名称 Light-sensitive composition.
摘要 <p>A positive working light-sensitive composition comprises (a) a compound capable of generating an acid through irradiation with actinic rays or radiant rays and (b) an organic polysiloxane compound having linear one-dimensional, branched or ladder type two-dimensional and/or three-dimensional network structures. The light-sensitive composition has high sensitivity, large tolerance with respect to light sources and excellent resistnce to oxygen plasma etching. Moreover, the composition is alkali-developable. Therefore, it can be used in preparing presensitized plate for use in making lithographic printing plates, proof sheets for process printing, figures for overhead projectors and in forming fine resist patterns employed for manufacturing IC circuits of semiconductor elements.</p>
申请公布号 EP0360618(A2) 申请公布日期 1990.03.28
申请号 EP19890309674 申请日期 1989.09.22
申请人 FUJI PHOTO FILM CO., LTD. 发明人 UMEHARA, AKIRA C/O FUJI PHOTO FILM CO. LTD.;AOAI, TOSHIAKI C/O FUJI PHOTO FILM CO. LTD.;AOTANI, YOSHIMASA C/O FUJI PHOTO FILM CO. LTD.;SUGIMOTO, MICHIKO C/O FUJI PHOTO FILM CO. LTD.
分类号 G03F7/004;G03F7/039;G03F7/075;H01L21/027 主分类号 G03F7/004
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