| 摘要 |
PURPOSE:To diagnose, at an early stage, whether a drawn pattern is good or bad by a method wherein a conductor substrate where a first position-accuracy monitoring pattern and a second positionaccuracy monitoring pattern have been drawn is immersed in a developer and a displaced amount of a pattern position is decided on the basis of an electric current flowing between the conductor substrate and an electrode immersed in the developer. CONSTITUTION:A first position-accuracy monitoring pattern 3A is drawn in a region other than a region where a main pattern 2 is drawn. The main pattern 2 is drawn; after that, a second position-accuracy monitoring pattern 3B of the same shape as the first position-accuracy monitoring pattern 3A is drawn in a position which is displaced by 2mum in an x direction from a position where the first position-accuracy monitoring pattern 3A has been drawn. Only a part where the first position-accuracy monitoring pattern and the second position-accuracy monitoring pattern 3A, 3B have been drawn is immersed in a developer 7 used to remove a resist selectively. An electrode 8 which is stable in the developer 7 is immersed in the developer 7; an electric current flowing between the electrode 8 and a conductor substrate 1 is detected; a displaced amount of a position of the main pattern is judged on the basis of a detected value of the electric current. |
