发明名称 METHOD OF REMOVING SURFACE POLLUTIVE MATERIAL BY IRRADIATION FROM HIGH ENERGY SOURCE, AND DEVICE
摘要 PURPOSE: To remove contaminates without changing the molecular structure on the surface using two types of radiant rays to irradiate the treatment surface of a substrate, one is required to remove surface contaminants by energy density and the time of continuation, and the other is required to change the molecular structure of the surface. CONSTITUTION: After the substrate 12, whose surface contaminants are to be removed, has been inserted to an encircling body 15, the encircling body 15 is repeatedly washed, inert gas 18 fills it, it is maintained at the pressure a little higher than the atmospheric pressure, and the flow-in of other gas is prevented. The power density of the radiant rays 11 directed to the treatment surface of the substrate 12 is selected in such a manner that the quantity of energy lower than the energy required to change the surface structure of the substrate is given during the continuation of the radiant rays. The level of said energy is determined by the composition of the substrate to be treated, and it corresponds in general to the forming heat required to damage various material. As a result, the surface contaminant can be removed without changing the molecular structure of the treatment surface.
申请公布号 JPH0286128(A) 申请公布日期 1990.03.27
申请号 JP19890177848 申请日期 1989.07.10
申请人 OODORII SHII ENGERUSUBAAGU 发明人 OODORII SHII ENGERUSUBAAGU
分类号 H01L21/302;B08B7/00;B23K26/14;G03F7/20;H01L21/00;H01L21/268;H01L21/28;H01L21/304;H01L21/306;H01L21/3065;H01L21/3205;H01L21/321;H01L21/768 主分类号 H01L21/302
代理机构 代理人
主权项
地址