| 摘要 |
PURPOSE:To assure high accuracy and high effectiveness without making the structure complicated by reducing the amount of a guided light, detecting the amount of a relative displacement between both superimposed alignment marks, and hereby shifting at least either of an object to be exposed and a pattern. CONSTITUTION:In alignment, part of a light from a light source for exposing an object 1 to be exposed is guided, with which light a second alignment mark Ah2 of a pattern is projected onto a first alignment mark Ah1 of the object 1. Thereupon, the guided light is attenuated through attenuation means 6 before it arrives at the object 1. Detector means 11 detects the amount of a relative displacement between both alignment marks on the basis of an optical superimposed image of both alignment marks. Movement means shifts at least one of the pattern 3 and the object 1 according to the amount of the relative displacement for proper positional matching between the pattern 3 and the object 1. Herein, the light corresponding to the amount of the displacement is converted to a light having the intensity enough to be detected for facilitating the monitoring of the alignment. |
