| 摘要 |
<p>A plasma etching system includes a radio frequency generator (12) and a parallel plate plasma reactor vessel (14). A phase inverter circuit is used to couple the RF generator to the electrodes (19, 21) in the plasma reactor (14) so that the electrodes (19, 21) are driven with voltages of substantially equal magnitude but which are 180 DEG out-of-phase. In this way, a maximum potential difference between the electrodes can be achieved while minimizing the potential difference between the individual electrodes (19, 21) and the reactor vessel (14). Such operation allows higher power levels with reduced occurrence of arcing and stray discharge, and provides a stable, uniform plasma discharge.</p> |
