发明名称 ORIGINAL PLATE FOR LITHOGRAPHY
摘要 PURPOSE:To simply obtain a lithographic plate having superior printing resistance with an output signal from a computer or the like, that is, by exposure or heat application by forming an image forming layer contg. a specified tetrazolium salt (co)polymer and a photoreducing agent or a thermal reducing agent on a hydrophilic support. CONSTITUTION:A (co)polymer represented by formulaIor II (where each of R1 and R2 is H, CH3, NO2, OH or COOH, X is Cl or Br, and n is 10-10,000) is used. The copolymerizable monomer is styrene, a styrene deriv., acrylic acid or the like. An image forming layer contg. the (co)polymer and a photoreducing agent such as quinone combined with an active hydrogen feeding source such as disulfide or polyethylene glycol or a thermal reducing agent such as polyphenol is formed on a hydrophilic support such as an Al plate provided with a hydrophilic property to obtain a water-developable original plate for lithography. The plate is imagewise exposed, or heat is imagewise applied to the plate by means of a thermal head. By immersing the plate in water, the unexposed part or the unheated part is dissolved and removed to manufacture a lithographic plate having superior printing resistance and giving clear prints.
申请公布号 JPS5897042(A) 申请公布日期 1983.06.09
申请号 JP19810194418 申请日期 1981.12.04
申请人 RICOH KK 发明人 IDE YOUJI
分类号 G03C1/72;B41M5/26;B41N1/14;G03F7/038 主分类号 G03C1/72
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