发明名称 Semiconductor integrated circuit device with high reliability wiring layers
摘要 A semiconductor integrated circuit device includes a semiconductor substrate and a wiring layer formed on the substrate. An output buffer transistor is provided with its gate formed along the direction of the wiring. The resulting device has improved area efficiency and is less susceptible to wiring element slide without requiring slits to be formed in the wiring structure-and thus also has lower current density.
申请公布号 US4908690(A) 申请公布日期 1990.03.13
申请号 US19870106880 申请日期 1987.10.13
申请人 MITSUBISHI DENKI KABUSHIKI KAISHA 发明人 HATA, MASAYUKI;NAKAGAWA, HIROMASA
分类号 H01L21/3205;H01L21/822;H01L23/52;H01L23/522;H01L23/528;H01L27/04 主分类号 H01L21/3205
代理机构 代理人
主权项
地址