| 摘要 |
<p>PURPOSE:To form the two-terminal element having a uniform area within the surface of an insulating substrate by varying the photosensitive types of a photoresist to be used in photolithography process within two stages. CONSTITUTION:The 1st photoresist 3 consisting of a positive resist is formed on a 1st solid electrode 2a formed on an insulating substrate 1 by using the photolithography process. The electrode 2a is then etched according to the patterns of the resist 3 to form the 1st electrodes 2b. An active layer 4 consisting of a ferrodielectric layer is then formed on the electrodes 3b. A 2nd photoresist 6 consisting of a negative resist is formed by using the photolithography process on a 2nd solid electrode 5a formed on the layer 4. The electrode 5a is etched according to the patterns of the resist 6 to form the 2nd electrodes 5b. The resists 3, 6 are the positive and negative type resists and are different in the photosensitive type in the above-mentioned stages. The two-terminal element having the uniform area is formed in this way.</p> |
