发明名称 SUBSTRATE SHIFTING DEVICE
摘要 <p>PURPOSE:To mitigate the force applied to a substrate to be shifted for making the delivery of the substrate smooth by a method wherein a holding mechanism is provided between a substrate holding hand and a driving mechanism so that the substrate holding hand may be shifted to offset the force applied to the substrate corresponding to the force. CONSTITUTION:A coil spring 8 provided to be laid between a substrate holding hand 1 and a holder 6 turns the holder 6 and said holding hand 1 in thetar direction as shown in figure by 180 degrees so that a semiconductor wafer 5 and the holding hand 1 may be held in floating state when the semiconductor wafer 5 is held looking downward. The semiconductor wafer 5 with its surface 5b looking downward is shifted to a wafer boat with an air cylinder 9 stopped as well as the substrate holding hand 1 and the semiconductor wafer 5 kept in the floating state. Consequently, the semiconductor wafer 5 can be prevented from being damaged by pressing it against the wafer boat due to the vertical shifting of the substrate holding hand 1 in the floating state.</p>
申请公布号 JPH0271544(A) 申请公布日期 1990.03.12
申请号 JP19880223061 申请日期 1988.09.06
申请人 TEL SAGAMI LTD 发明人 IWABUCHI KATSUHIKO;TAKANABE EIICHIRO
分类号 B65G47/91;H01L21/677;H01L21/68 主分类号 B65G47/91
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