| 摘要 |
PURPOSE:To easily update an aligning mark by moving a mask by a moving mechanism so that the photomask of a light and the position to be radiated of the wafer are movable corresponding to the updated aligning mark. CONSTITUTION:A reference lattice mark 9 formed on the top of a reference lattice 7 is moved by a moving mechanism 11 to arbitrarily move in parallel the optical path of a laser beam reflected by a mirror 6. The parallel-moved beam is focused on a position moved by a Fourier-converted lens unit 8. The mechanism 11 is so controlled by a controller with the output of a photodetector 16 that the moved focused position is brought onto updated position marks 13b, 14b. Here, since the output exhibit maximum values (a), (b) when the focused image of the photodetector 16 as the mask 9 is moved is brought into coincidence with a photomask 1, the alignment marks 13, 14 of the wafer 2, the mechanism 11 of the mask 9 is so controlled as to obtain the maximum value to automatically and easily update the marks 13b, 14b. |
