DEVICE FOR PLASMA PROCESSING WITH AN ANODE

摘要

A device for plasma processing has a cathodically connected charging plate (20) for receiving several adjacent and if necessary superimposed workpieces (22 to 30), as well as an anode. The anode has an electroconductive supporting part (34) located above the workpieces (22 to 30) and connected to a glow potential supply line. Elongated individual anodes (36 to 38) can be secured to the supporting part at various selectionable locations and protrude between the adjacent workpieces (22 to 30).