发明名称 |
POLYAMID OCH FILM SOM INNEHAOLLER MINST ETT MONOMOLEKULAERT SKIKT AV EN POLYAMID. |
摘要 |
<p>Polyamides of the general formula [N(A)-X-N(B)-CO-Y-CO-]n are described, in which Y denotes a divalent group, X a divalent radical whose chain contains at least two carbon atoms, A and B independently of one another denote H or a C1 to C26 alkyl group and n denotes an integer greater than 4. The said polyamides contain at least one alkyl group of C6 to C26 per repeating unit. The groups X and/or Y contain at leat one CH2 group in the chain. The polyamides are prepared by reaction of a diamine of the formula NHA-X-NHB with an about equimolar amount of a reactive derivative of a dicarboxylic acid of the formula COOH-Y-COOH. The polyamides obtained can be used in order to prepare highly ordered monomolecular LB films on a support. For this purpose, the polyamide is dissolved in a volatile organic solvent which is immiscible with water and the solution is spread on the water/air interface. After evaporation of the solvent the layer is compressed and transferred to a solid support by the LB technique. The film is very stable and can be used to prepare optical waveguide systems, filters for optical purposes or protective layers.</p> |
申请公布号 |
FI894182(A) |
申请公布日期 |
1990.03.08 |
申请号 |
FI19890004182 |
申请日期 |
1989.09.05 |
申请人 |
HOECHST AKTIENGESELLSCHAFT |
发明人 |
CHERDRON, HARALD;PRASS, WERNER;SCHEUNEMANN, UDE;LUPO, DONALD |
分类号 |
B05D1/20;B32B27/34;C08G69/26;C08J5/18;(IPC1-7):C08G/ |
主分类号 |
B05D1/20 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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