| 摘要 |
PURPOSE:To allow uniform and secure coating by passing resin particles and photoconductive resin particles through an impact part which is formed of a rotating piece and a stationary piece and has the shortest spacing thereby applying and fixing the photoconductive particles to the resin particle surfaces. CONSTITUTION:The pretreated resin particles A and the photoconductive resin particles B having <=0.2 grain size ratio with respect to the resin particles A are passed through the impact part 19 which is formed of the rotating piece 15 and the stationary piece 18 and have the shortest spacing of 0.5 to 5mm under the conditions of 10 to 90 deg.C atm. temp. so that the photoconductive resin particles B are immobilized onto the surfaces of the resin particles A by the mechanical impact in the impact part 19. The liberation of the particles in the subsequent stages, for example, agitating at the time of external addition of silica, etc., or agitating, rubbing, etc., at the time of development is, therefore, obviated. the uniform and secure coating is executed in this way. |
