发明名称 VACUUM VAPOR DEPOSITION DEVICE
摘要 PURPOSE:To produce a vapor deposited tape of high quality with good efficiency, by connecting a containing chamber which contains a ferromagnetic material to be heated with heating means in a vacuum state to a vapor depositing chamber, and making it possible to form a ferromagnetic thin film on a tape-like polymer substrate. CONSTITUTION:The ferromagnetic material in a vapor source vessel 5 held in a vacuum depositing chamber 11 is heated with electron beams and evaporates at a specified rate. The vapor is deposited on a tape-like polymer substrate under winding. Upon completion of the vapor deposition, a gate valve 17 partitioning the chamber 11 and a containing chamber 16 is opened, and the vessel 5 is transferred into the chamber 16, then the valve 17 is closed and the vessel 5 is maintained of temp. with an electron gun 19. During this time, the vacuum in the chamber 11 is broken and the preparation for the next vapor deposition is made; thereafter the valve 17 is opened, the vessel 5 is returned to the home position, the valve 17 is closed and the vapor deposition is resumed. With such device, many times of vapor deposition are executed repeatedly, whereby efficiency is improved and the films of high purity are obtained without dissipation of impurities from the vessel 5.
申请公布号 JPS58100676(A) 申请公布日期 1983.06.15
申请号 JP19810199270 申请日期 1981.12.09
申请人 MATSUSHITA DENKI SANGYO KK 发明人 SHINOHARA KOUICHI
分类号 C23C14/20;C23C14/24;C23C14/56 主分类号 C23C14/20
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