发明名称 Laser apparatus
摘要 Laser apparatus includes hydrogen or deuterium buffer gas and dispenser reservoirs which contain a hydride or deuteride as appropriate. As gas molecules from the buffer gas are lost within the discharge tube due to trapping and sputtering processes, hydrogen or deuterium is given off from the surfaces of the reservoirs at a greater rate to maintain the vapor pressure within the discharge tube at a substantially constant level. Thus the laser apparatus may operate in a "sealed-off" mode, that is without requiring that buffer gas be flowed through it.
申请公布号 US4907243(A) 申请公布日期 1990.03.06
申请号 US19890374923 申请日期 1989.07.03
申请人 ENGLISH ELECTRIC VALVE COMPANY, LTD. 发明人 MENOWN, HUGH;MAITLAND, ARTHUR;CLARK, GRAEME L.
分类号 H01S3/03;H01S3/036 主分类号 H01S3/03
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