发明名称 SYNTHETIC SILICA GLASS FOR RESISTING ULTRAVIOLET LIGHT AND PRODUCTION THEREOF
摘要 PURPOSE:To obtain the title silica glass causing no solarization even exposed to high-energy radiation by heating in a He gas a synthetic silica glass produced by flame hydrolysis to effect degasification. CONSTITUTION:A synthetic silica glass produced by flame hydrolysis is heated in a He gas at >=500 deg.C to effect degasification, thus obtaining the objective synthetic silica glass. This silica glass is 1-1000ppm in OH group content and <=0.1ml/100g in dissolved hydrogen gas. If <1ppm on the OH group content, a ultraviolet absorption peak at 260nm will be developed. On the other hand, in case of >1000ppm in said OH group content, a solarization will occur by increasing the ultraviolet absorption near 170nm. And if >0.1ml/100g in the dissolved hydrogen gas, a solarization will also be developed by increasing the ultraviolet absorption at 180-220nm.
申请公布号 JPH0264028(A) 申请公布日期 1990.03.05
申请号 JP19880215484 申请日期 1988.08.30
申请人 SHIN ETSU CHEM CO LTD 发明人 YOKOGAWA KIYOSHI;KAMIYA KAZUO
分类号 C03C3/06;C03B8/04;C03B19/14;C03B20/00 主分类号 C03C3/06
代理机构 代理人
主权项
地址