| 摘要 |
A light exposure apparatus comprises a suction pump to make a wafer to be sucked, and chuck platen (22) for deforming the wafer along the bending line while the chuck platen having a slit (25) which is made up of a number of mesh channel pattern. The wafer having channel pattern and another wafer able to move its pattern, while maintaining the space between the wafers with the action of a number of vertical mover (23), are designed to be deformed. The end of the slit is U- shaped or V-shaped.
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