发明名称 PROCESS AND APPARATUS FOR PLASMA REACTION
摘要 PURPOSE:To maintain high frequency induction plasma stably by irradiating a mixture of a reactant with plasma gas with laser light to excite and heat the reactant, then introducing the reactant into a top zone of the high frequency induction plasma. CONSTITUTION:A head part 1 of a plasma torch is arranged to above a plasma torch part 3 having a high frequency work coil 5 on the external periphery interposing thereby a part 2 to be irradiated with laser light, and a tip end of an introducing pipe 12 for the plasma gas and the reactant is arranged to the part 2 to be irradiated with laser light. The mixture of the reactant and the plasma gas is irradiated with laser light to excite and heat the reactant, then the product is introduced to a top zone of high frequency induction plasma. By this process, clean thermal plasma can be obtd., moreover, the plasma can be maintained stably and heating of a reactant to extremely high temp. has becomed possible.
申请公布号 JPH0263549(A) 申请公布日期 1990.03.02
申请号 JP19880213333 申请日期 1988.08.27
申请人 AGENCY OF IND SCIENCE & TECHNOL 发明人 OKUYA TAKESHI;NAKADA YOSHINORI;SUZUKI MASAAKI
分类号 B01J19/08;B01J19/12 主分类号 B01J19/08
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