发明名称 SUBSTRATE FOR EXPOSURE USE
摘要 PURPOSE:To let a cleaning liquid remain in a groove formed at an outer periphery face of a substrate for exposure use and to prevent the surface of the substrate for exposure use from being influenced adversely by a method wherein the groove is formed at the outer periphery face of the substrate for exposure use by a simple and easy working operation. CONSTITUTION:A groove 1a is formed at an outer periphery face 1b of a substrate 1 for exposure use. A holder 2a of a cleaning jig 2 is coupled to the groove 1a formed at the outer periphery face 1b of the substrate 1 for exposure use; the substrate 1 for exposure use is held for a cleaning operation.
申请公布号 JPH0263120(A) 申请公布日期 1990.03.02
申请号 JP19880216115 申请日期 1988.08.29
申请人 FUJITSU LTD 发明人 KANEMITSU HIDEYUKI
分类号 H01L21/02;G03F1/60;G03F9/00;H01L21/304 主分类号 H01L21/02
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