| 摘要 |
PURPOSE:To improve the processing capacity of a line and to speed up operation on the whole device by coupling coaters which are long in processing time in series. CONSTITUTION:The water 6 of the lowermost stage is taken out of a carrier 7 by a sender 1, a coater 2A is passed placed on the chuck 21 of a coater 2B, and a 2nd wafer 6 is put on the chuck 21 of the coater 2A. The wafer 6 of the coater 2B is conveyed to heat plates 3C and 3D after resist is applied. Simultaneously, the wafer 6 of the coater 2A passes the coater 2B and is conveyed onto a heat plate 3C, and an unprocessed wafer 6 is conveyed by the send or 1 to two coaters 2 in order similarly. The wafer 6 after being heated by a heat plate D is received by a receiver 4. The wafer on the heat plate 3C is carried by a moving beam 31. Thus, coaters 2 are coated with resist and calcined by heat plates 3 in order. The coaters which are long processing time are coupled in series, so the processing capacity of the line is high. |
