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发明名称
PRODUCTION OF SPUTTERING TARGET
摘要
申请公布号
JPH0261061(A)
申请公布日期
1990.03.01
申请号
JP19880211195
申请日期
1988.08.25
申请人
SEIKO EPSON CORP
发明人
AOYAMA AKIRA;SHIMOKAWATO SATOSHI;YAMAGISHI TOSHIHIKO;YAZAKI CHIKAO
分类号
C23C14/34
主分类号
C23C14/34
代理机构
代理人
主权项
地址
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