Method for producing small openings in thin films

摘要

The invention relates to a method for producing small openings in thin films, especially for producing contact windows on a mesa structure of a semiconductor component. In this case, only the mesa structure is coated very thinly with a polymerisable layer which can then be selectively removed, for example by an O2 plasma. A (contact) window results, in which a further wet-chemical or plasma etching can be carried out.