发明名称 Verfahren zum tiegelfreien Zonenschmelzen von Halbleiterstaeben, insbesondere aus Silizium
摘要 A rod of silicon, produced by the deposition of silicon from a gaseous or vaporous silicon compound on to an electrically resistance heated carrier rod of silicon having terminal pieces of carbon or graphite, is subjected to the passage of a molten zone produced by induction heating while still attached to at least part of one terminal piece, said part being heated first thereby effecting preheating of the adjacent end of the rod by conduction before formation of the molten zone by induction heating. The molten zone may be initially formed in the adjacent end of the rod or at the opposite end adjacent a seed crystal after passage of a hot non-molten zone through the rod. Specification 861,135 is referred to.
申请公布号 DE1094711(B) 申请公布日期 1960.12.15
申请号 DE1959S062919 申请日期 1959.05.08
申请人 SIEMENS-SCHUCKERTWERKE AKTIENGESELLSCHAFT 发明人 DIPL.-CHEM. DR. PHIL. NAT. KONRAD REUSCHEL
分类号 C01B33/02;C30B13/00;C30B13/20 主分类号 C01B33/02
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