| 摘要 |
PURPOSE:To analyze a specimen having a minute pattern highly accurately at high sensitivity by providing an ion beam deflector by which the scanning direction of an ion beam can be selected arbitrarily. CONSTITUTION:Reference AC generators 14 and 14' generating reference AC voltages Vx and Vy and a voltage synthesizing and distributing device 15 are provided in a deflecting power source 10. The distributing device 15 receives the reference AC voltages Vx and Vy and outputs four kinds of voltages Vxp, Vxn, Vyp and Vyn shown by expressions. The four kinds of the scanning voltage signals are imparted to deflecting electrodes 4, and an ion beam 12 is made to scan over a specimen 5. An angle theta is an angle corresponding to the scanning direction. The angle is selected with the volume of the distributing device 15. The voltage signals Vxp and Vxn and Vyp and Vyn are imparted to facing electrodes 4, respectively. Since the scanning angle theta of the beam 12 on the specimen can be set arbitrarily, the scanning direction of the ion beam can be determined so that analyzing regions C and C' can be provided widely for the desired analyzing parts and the beam 12 is made to scan only the regions to be analyzed. |
