Spectral photometric film thickness measurement - using reflection or transmission of spectrally modulated poly:chromatic light and spectrally sensitive electronic component

摘要

The method of spectral photometric film thickness measurement involves the reflection of transmission of polychromatic light. A spectrally sensitive electronic component is used to perform intensity dependent measurement of the variations in the spectral composition of the polychromatic light reflected or transmitted by the transparent or partially transparent film. The electronic component converts the spectral composition variation measured into up to three electrical signals. The polychromatic light can be spectrally modulated and can be homogeneously applied over the entire surface or focussed onto specific regions. USE/ADVANTAGE - Enables rapid, non-destructive measurement in all types of thin film mfr. including material coating, microelectronics and optics. Can be implemented accurately, facilitating real-time control.