发明名称 NEGATIVE TYPE RESIST COMPOSITION
摘要 PURPOSE:To improve the dry etching durability of the subject composition against an oxygen gas by incorporating a novolak resin contg. a bisphenol having a siloxane binding and a bisazide compd. in the composition. CONSTITUTION:An alkali-soluble novolak resin is obtd. by allowing it to react at least one of a siloxane compd. selected from 1,3-bis(m-hydroxyphenyl) tetramethyldisiloxane, and 1,3-bis(m-hydroxyphenyl)-1,3-dimethyl-1,3-diphenyl disiloxane, etc., with aldehydes, or a mixture of at least one of a siloxane compd. selected from 1,3-bis(m-hydroxyphenyl) tetramethyldisiloxane 1,3-bis(m- hydroxyphenyl)-1,3-dimethyl-1,3-diphenyldisiloxan-e, etc., and another phenols with the aldehydes. The alkali-soluble novolak resin and the bisazide compd. are incorporated in the composition. Thus, the durability of the composition is improved.
申请公布号 JPH0253057(A) 申请公布日期 1990.02.22
申请号 JP19880203806 申请日期 1988.08.18
申请人 KANTO CHEM CO INC 发明人 KATSURAGI HAYATO;ISHIKAWA NORIO;MORI KIYOTO
分类号 G03F7/012;G03F7/075;H01L21/027 主分类号 G03F7/012
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