| 摘要 |
PURPOSE:To eliminate such problems as irregularities in development and characteristics and to improve the yield of a developing process by varying continuously the concentration of a liquid developer which is discharged to a wafer to be developed. CONSTITUTION:The wafer 1 is mounted on a turntable 2 and rotated at low speed. Then the concentration of the liquid developer which is discharged from a liquid developer and pure water concentration varying nozzle 3 is varied as shown in a graph and preprocessing and development are carried out. When the wafer 1 is thus developed, the concentration of the liquid developer is increased gradually from a point of 0%, i.e. a point 7 to a point 8, so the liquid developer has little variation in concentration while the turntable makes one turn. Consequently, the development is carried out uniformly over the entire surface of the wafer 1, defects in the development are decreased, and the yield of the process is improved. |
