| 摘要 |
PURPOSE: To make a device mechanically strong and easy to be handled and make a working processing exact by using a grating as a reference for setting a reference location setting part and a particle beam column. CONSTITUTION: A grating is formed in a silicon die 50 of a thicker structure and further has a plurality of square holes 66 of periodic intervals enabling the direct matching with an electronic equipment 30. The square holes 66 which are constituted to be about 32 microns in one side and about 64 microns in periodic intervals are used for a specified particle beam lithography device. To prevent charged particle or electron from passing through a side wall, the upper/lower bottoms of a grating bar 62, an edge 60 and a side wall 54, all the surfaces of them are coated with proper materials and a 72 portion is coated with gold. Further, the grating is mounted in a grating holder whose inclination and height are adjustable and further is aligned with an X-Y reference mirror mounted on a worked product stage 32. |
